SiC Coated Graphite Carriers for Wafer Processing

High Strength CFC Material Hot Zone Components for Crystal Growth Furnaces

Flexible Purified Graphite Felt 3mm for Silicon Carbide Crystal Growth Insulation

Flexible Purified Graphite Felt 5mm for High Temperature Hot Zone Insulation Rolls

Flexible Purified Graphite Felt 10mm for Heavy Duty Crystal Growth Insulation

Ultra-Low Ash Semiconductor Rigid Felt for Crystal Growth Furnaces

Standard Ash Semiconductor Rigid Felt for Silicon Carbide Crystal Growth

SiC Cantilever Paddle for Diffusion Furnaces with Up to 15kg Load Capacity

SiC Furnace Tube for LPCVD and High-Temp Oxidation Diffusion

SiSiC Wafer Boat with CVD SiC Coating for Diffusion Furnaces

High Purity RSiC Wafer Boat for Epitaxy Process

SiC Wafer Boat for Epitaxy with Plasma Resistance

2000°C Class SiC Wafer Boat for Crystal Growth

Low-Hydroxyl Quartz Furnace Tube for Oxidation Diffusion Furnaces

Ultra-High Purity Quartz Wafer Boat GE214 for Diffusion Furnaces

CVD SiC Etch Ring for Plasma Etcher with Ultra-Low Metal Impurity

CVD SiC Particles for PVT Crystal Growth 6N+ Purity

CVD SiC Etching Ring for Plasma Etch Chambers

High Temperature MOCVD Multi-Pocket Wafer Susceptor Tray TaC Coating

MOCVD 6N CVD SiC Coated Graphite Carrier for Epitaxy